Semiconductor processing chamber with filament lamps having nonuniform heat output

A semiconductor processing system comprising:

• a reaction chamber comprising:
• a substrate holder configured to support a semiconductor substrate;
• and
• a top array of linear heat lamps, wherein at least one lamp of the top array of linear heat lamps is configured to provide a power output, the power output varying across a length of the at least one lamp,
• wherein the at least one lamp includes peripheral portions and a central portion between the peripheral portions, wherein the peripheral portions and the central portion each comprise a conducting wound filament,
• wherein a winding density of the conducting wound filament in the central portion is greater than a winding density of each of the conducting wound filaments in the peripheral portions,
• wherein the power output is higher within the central portion relative to the power output within the peripheral portions of the at least one lamp, and
• wherein the at least one lamp of the top array of linear heat lamps comprises a center lamp of the top array of linear heat lamps in which length of the central portion of the at least one lamp is smaller than length of the peripheral portions of the at least one lamp.