Method of processing substrate, substrate processing apparatus, method of manufacturing semiconductor processing apparatus, and recording medium
AssigneeKokusai Electric Corporation
InventorsTeruo Yoshino, Naofumi Ohashi, Toshiro Koshimaki
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Abstract
There is provided a technique that includes abnormality detecting by picking up a sound generated from a transfer configured to be capable of transporting the substrate and comparing a waveform of sound data with a preset threshold value to detect an abnormality of the transfer; and failure detecting by picking up vibration of the transfer and comparing a waveform of vibration data with a preset threshold value to detect a failure of the transfer.
Claims18
A method of processing a substrate, comprising:
- abnormality detecting by picking up a sound generated from a transfer that is configured to be capable of operating in a vacuum and transporting the substrate in a vacuum transfer chamber, and comparing a waveform of sound data with a preset threshold value to detect an abnormality of the transfer;
- and
- failure detecting by picking up vibration of the transfer and comparing a waveform of vibration data with a preset threshold value to detect a failure of the transfer,
- wherein the transfer is arranged in the vacuum transfer chamber,
- wherein a gas-filled container is filled with a gas, is installed with a microphone inside the gas-filled container, is installed to the transfer, and is arranged in the vacuum transfer chamber, and
- wherein the act of the abnormality detecting includes receiving sound data detected by the microphone.
A substrate processing apparatus, comprising:
- a process chamber configured to be capable of processing a substrate;
- a first transfer configured to be capable of transporting the substrate;
- a first transfer chamber configured to be capable of accommodating the first transfer;
- a sound information receiver configured to be capable of receiving sound information generated from the first transfer;
- a vibration information receiver configured to be capable of receiving vibration information generated from the first transfer;
- an abnormality detector configured to be capable of detecting an abnormality in the first transfer by comparing a waveform of the sound information with a preset threshold value;
- and
- a failure detector configured to be capable of detecting a failure of the first transfer by comparing a waveform of the vibration information with a preset threshold value,
- wherein the first transfer chamber is a vacuum transfer chamber,
- wherein the first transfer is configured to be capable of operating in a vacuum, and is arranged in the vacuum transfer chamber,
- wherein a gas-filled container is filled with a gas, is installed with a first microphone inside the gas-filled container, is installed to the first transfer, and is arranged in the vacuum transfer chamber, and
- wherein the sound information receiver is configured to be capable of receiving sound information detected by the first microphone.
A method of manufacturing a semiconductor processing apparatus, comprising:
- transporting a substrate by a transfer that is configured to be capable of operating in a vacuum;
- maintaining a vacuum state of a transfer chamber accommodating the transfer;
- processing the substrate;
- receiving sound information for the transfer;
- receiving vibration information for the transfer;
- and
- performing, by an operation controller, at least one selected from the group of notification of an abnormality of an apparatus and stop of an operation when an abnormality is determined as a result of analysis of information received in the act of receiving the sound information or the act of receiving the vibration information,
- wherein a gas-filled container is filled with a gas, is installed with a microphone inside the gas-filled container, is installed to the transfer, and is arranged in the transfer chamber, and
- wherein the act of receiving the sound information for the transfer includes receiving sound information detected by the microphone in the vacuum state of the transfer chamber.
Dependencies are inferred from the claim text.