Microarray fabrication system and method

A method comprising:

• forming a patterned substrate that comprises a plurality of base pads, using a nano-imprint lithography process, wherein forming the patterned substrate comprises:
• forming a transfer layer on a substrate die;
• forming an imprint resist layer on the transfer layer;
• contacting the imprint resist layer with a working mold, the working mold comprising a plurality of lands separated by recessed portions, and creating in the imprint resist layer a plurality of imprint resist regions separated by transfer regions at which portions of the transfer layer are exposed from the imprint resist layer;
• at least partially curing the imprint resist regions;
• removing the exposed portions of the transfer layer at the transfer regions so as to expose portions of the substrate die;
• depositing a deposition material on the imprint resist regions and the exposed portions of the substrate die so as to form the base pads on the substrate die;
• and
• removing portions of the transfer layer, imprint resist layer, and deposition material from the substrate die at locations other than the base pads;
• and
• attaching a capture substance to each of the plurality of base pads, optionally through a linker, the capture substance being adapted to promote capture of a target molecule.