Array substrate, manufacturing method of the array substrate, and display panel

A manufacturing method of an array substrate, comprising:

• forming a buffer layer on a glass substrate;
• forming a photoresist layer having a first preset pattern on the buffer layer, wherein when forming the photoresist layer having the first preset pattern on the buffer layer, the buffer layer is not etched;
• placing the glass substrate comprising the photoresist layer having the first preset pattern into an activation agent for activation, and forming an activating particle layer having the first preset pattern at a corresponding position where the activation agent is in contact with the photoresist layer having the first preset pattern, and forming an activating particle layer having a second preset pattern at a corresponding position where the activation agent is in contact with the buffer layer;
• removing the photoresist layer having the first preset pattern and the activating particle layer having the first preset pattern;
• performing chemical plating to form a first metal layer having the second preset pattern at a position corresponding to the activating particle layer having the second preset pattern;
• and
• sequentially forming an insulating layer, an active layer, a second metal layer, a passivation layer and a transparent electrode layer on the first metal layer.