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US 11,827,971 B2Granted
Sputtering target
AssigneeDexerials Corporation
InventorYuichi Kamori
Life of this patent
Estimating the term…
Abstract
The present invention provides a sputtering target which has low risk to the human body, and which is able to be suppressed in the occurrence of a crack even in cases where sputtering is carried out at a high output power for a long period of time. A sputtering target contains Zn as a main component, contains specific metals including Zr in specific compositions, and contains a complex oxide of Zr.
Claims9
A sputtering target comprising:
- Zn, Sn, Zr Ca, and O, and being free of indium oxide,
- wherein content of Zn is 30 to 60 mol % relative to overall metal component,
- wherein content of Zr is 10 to 40 mol % relative to overall metal component, and
- the sputtering target comprising a complex oxide of Zr.
1 more element
Dependencies are inferred from the claim text.