Array substrate, fabrication method thereof, liquid crystal display panel and display device

A fabrication method of an array substrate, comprising:

• providing a substrate;
• forming a wire grid polarization layer on a whole surface of the substrate;
• forming a transparent pattern consistent with a pattern of the wire grid polarization layer on the wire grid polarization layer located in an open region in a pixel region of the substrate;
• and
• etching the wire grid polarization layer by taking the transparent pattern as a mask;
• wherein the wire grid polarization layer comprises a plurality of metal wires, and slits are formed between the metal wires, when forming the transparent pattern consistent with a pattern of the wire grid polarization layer, the method further comprises:
• forming filler filling the slits, wherein the filler and the transparent pattern are of an integrated structure;
• a material of the filler is indium tin oxide or indium zinc oxide;
• wherein the forming the filler filling the slits when forming the transparent pattern consistent with the pattern of the wire grid polarization layer comprises:
• forming a transparent material layer covering the metal wires, wherein gaps are formed between the transparent material layers in a same slit or between the transparent material layers in a same slit are in contact with each other;
• coating the transparent material layers in the open region in the pixel region with a photoresist;
• and
• etching the transparent material layers by taking the photoresist as a mask to form the transparent pattern with an orthographic projection overlapping with the metal wires and the filler filling the slits, wherein
• the filler comprises a first subsection in contact with the metal wire at one side of the slit where the filler is located, a second subsection in contact with the metal wire at other side of the slit where the filler is located and a third subsection connecting the first subsection with the second subsection;
• a gap is formed between the first subsection and the second subsection;
• the third subsection is in contact with the substrate.

An array substrate, comprising a substrate, a wire grid polarization layer located in an open region in a pixel region of the substrate and a transparent pattern located at a side, away from the substrate, of the wire grid polarization layer and consistent with a pattern of the wire grid polarization layer;

• wherein the wire grid polarization layer comprises a plurality of metal wires, and slits are formed between the metal wires;
• and the array substrate further comprises:
• filler located in the slits, wherein the filler and the transparent pattern are of an integrated structure;
• a material of the filler is indium tin oxide or indium zinc oxide;
• wherein the filler comprises a first subsection in contact with a metal wire at one side of the slit where the filler is located, a second subsection in contact with a metal wire at the other side of the slit where the filler is located and a third subsection connecting the first subsection with the second subsection;
• the third subsection is in contact with the substrate;
• wherein the slits are completely filled with the filler.