Si-containing film forming precursors and methods of using the same

A method for producing halosilazane, the method comprising

• halogenating a hydrosilazane with a trityl halide halogenating agent to produce the halosilazane, the halosilazane having a formula
• (SiHa(NR2)bXc)(n+2)Nn(SiH(2−d)Xd)(n−1),
• wherein each a, b, c is independently 0 to 3;
• a+b+c=3;
• d is 0 to 2 and n≥1;
• wherein X is selected from a halogen atom selected from F, Cl, Br or I;
• each R is selected from H, a C1-C6 linear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR′3];
• further wherein each R′ of the [SiR′3] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C1-C4 saturated or unsaturated hydrocarbyl group, a C1-C4 saturated or unsaturated alkoxy group, or an amino group [—NR1R2] with each R1 and R2 being further selected from H or a C1-C6 linear or branched, saturated or unsaturated hydrocarbyl group, provided that when c=0, d≠0;
• or d=0, c≠0, and
• wherein the halogenating step includes the steps of
• forming a mixture comprising the hydrosilazane, the halogenating agent;
• adding a catalyst into the mixture;
• and
• separating the formed halosilazane from the mixture, wherein the halosilazane is produced by selective halogenation of the hydrosilazane that has a general formula (SiHa(NR2)b)(n+2)Nn(SiH2)(n−1), wherein each a, b, c is independently 0 to 3;
• a+b+c=3;
• d is 0 to 2 and n≥1;
• wherein X is selected from a halogen atom selected from F, Cl, Br or I;
• each R is selected from H, a C1-C6 linear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR′3];
• further wherein each R′ of the [SiR′3] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C1-C4 saturated or unsaturated hydrocarbyl group, a C1-C4 saturated or unsaturated alkoxy group, or an amino group [—NR1R2] with each R1 and R2 being further selected from H or a C1-C6 linear or branched, saturated or unsaturated hydrocarbyl group,
• wherein a selectivity of halogenation of the hydrosilazane ranges from approximately 30% to approximately 100%.