Plasma source and method for removing materials from substrates utilizing pressure waves
AssigneeAP Solutions, Inc.
InventorPeter Joseph Yancey
Life of this patent
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Abstract
In a method is provided for removing a material from a substrate, a plasma is generated at atmospheric pressure. The plasma includes an energetic species reactive with one or more components of the material. The plasma is flowed from an outlet as a plasma plume that includes periodic regions of high plasma density and low plasma density. The material is exposed to the plasma plume. At least one component of the material reacts with the energetic species, and at least one other component of the material is physically impacted and moved by one or more of the regions of high plasma density.
Claims15
A method for removing a material from a substrate on which the material is disposed, the method comprising:
- generating, by a plasma-generating chamber having a plasma-generating region, a non-thermal plasma at atmospheric pressure, the plasma comprising an energetic species reactive with one or more components of the material, wherein the plasma-generating chamber contains a dielectric structure located against an interior wall of the plasma-generating chamber and through which the gas passes;
- providing a powered electrode extending through the dielectric structure and extending partially into the plasma-generating region of the plasma generating chamber which is beside the dielectric structure through which the gas passes, and the electrode being coupled to a power source configured to power to the atmospheric pressure, non-thermal plasma;
- and
- providing a plasma outlet downstream from the electrode, communicating with the plasma-generating chamber, and out-letting the plasma to outside the chamber;
- and
- wherein the atmospheric pressure, non-thermal plasma plume comprising energetic plasma species emitted from the plasma outlet at a supersonic velocity into an ambient environment outside the atmospheric pressure plasma source,
- wherein, with the power source powering the atmospheric pressure, non-thermal plasma, the plasma plume outside the atmospheric pressure plasma source comprises periodic regions of pressure waves of high plasma density and low plasma density, and
- wherein the regions of high plasma density outside the atmospheric pressure plasma source comprise shockwaves effective for enhancing removal of material from a substrate with which the plasma plume having the periodic regions of high plasma density and low plasma density interacts.
A method for removing a material from a substrate on which the material is disposed, the method comprising:
- generating, by a plasma-generating chamber having a plasma-generating region, atmospheric pressure, non-thermal plasma, having a connector for a gas supply configured for feeding a gas to the plasma-generating chamber, wherein the plasma-generating chamber contains a dielectric structure located against an interior wall of the plasma-generating chamber and through which the gas passes;
- providing a powered electrode extending through the dielectric structure and extending partially into the plasma-generating region of the plasma generating chamber which is beside the dielectric structure through which the gas passes, and the electrode coupled to a power source configured to provide power to the atmospheric pressure, non-thermal plasma;
- providing a nozzle downstream from the electrode, communicating with the plasma-generating chamber, out-letting the plasma to outside the chamber, and which directs an atmospheric pressure, non-thermal plasma plume at a supersonic velocity into an ambient environment outside the atmospheric pressure plasma source,
- wherein, with the power source powering the atmospheric pressure, non-thermal plasma, the plasma plume outside the atmospheric pressure plasma source comprises periodic regions of pressure waves of high plasma density and low plasma density, and
- wherein the regions of high plasma density outside the atmospheric pressure plasma source comprise shockwaves effective for enhancing removal of material from a substrate with which the plasma plume having the periodic regions of high plasma density and low plasma density interacts.
Dependencies are inferred from the claim text.