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US 11,809,080 B2Granted
Extreme ultraviolet photoresist with high-efficiency electron transfer
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWei-Han Lai, Chin-Hsiang Lin, Chien-Wei Wang
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Abstract
A method includes forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer, a sensitizer, and a photo-acid generator (PAG), wherein the sensitizer includes a resonance ring that includes nitrogen and at least one double bond. The method further includes performing an exposing process to the photoresist layer. The method further includes developing the photoresist layer, thereby forming a patterned photoresist layer.
Claims20
A method, comprising:
- forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer responsive to an acid, a photo-acid generator (PAG), and a sensitizer bonded to the polymer, wherein the sensitizer includes an imidazole ring and a hydroxy, wherein the hydroxy is attached to a carbon atom in the imidazole ring, wherein the carbon atom is directly bonded to a nitrogen atom in the imidazole ring, wherein the PAG includes a sulfonium cation or an iodonium cation, wherein the PAG further includes a heterocyclic ring directly bonded to the sulfonium cation or the iodonium cation, and wherein the heterocyclic ring includes one nitrogen atom and less than six carbon atoms;
- performing an exposing process to the photoresist layer;
- and
- developing the photoresist layer, thereby forming a patterned photoresist layer.
1 more element
A method, comprising:
- forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer having an acid labile group, a photo-acid generator (PAG), a sensitizer bonded to the polymer, wherein the PAG includes a sulfonium cation and three heterocyclic rings directly bonded to the sulfonium cation, and wherein the sensitizer includes an imidazole ring fused with a pyridine ring and a hydroxyl group bonded to a carbon atom adjacent to a nitrogen atom in the imidazole ring;
- performing an exposing process to the photoresist layer;
- and
- developing the photoresist layer, thereby forming a patterned photoresist layer.
1 more element
A method, comprising:
- forming a photoresist layer over a substrate, wherein the photoresist layer includes a polymer responsive to an acid, a photo-acid generator (PAG), and a sensitizer bonded to the polymer, wherein the sensitizer includes an imidazole ring and a hydroxy bonded to a carbon atom adjacent to a nitrogen atom in the imidazole ring, wherein the PAG includes a sulfonium cation and three heterocyclic rings directly bonded to the sulfonium cation;
- performing an exposing process to the photoresist layer;
- and
- developing the photoresist layer, thereby forming a patterned photoresist layer.
1 more element
Dependencies are inferred from the claim text.