Substrate processing apparatus and method

A substrate processing apparatus, comprising:

• a substrate support provided with a support surface for supporting a substrate or a substrate carrier thereon, a heat shield, and a support heater disposed below the support surface, the support heater constructed and arranged to heat the support surface, wherein:
• the heat shield is configured to selectively cover the substrate support when the substrate support is separated from the carrier;
• the heat shield at least partially forms a chamber constructed and arranged to store the substrate support therein;
• and
• the heat shield is separately and independently movable relative to the support surface of the substrate support,
• wherein the substrate support comprises an upper plate, a cylindrical side plate and a bottom plate, which plates are interconnected to define a generally cylindrical container,
• wherein an outer surface of the upper plate defines the support surface of the substrate support, and
• wherein the container defines a body that extends between the upper plate and the bottom plate, which body accommodates at least part of the support heater.