Optical device metrology systems and related methods
AssigneeApplied Materials, Inc.
InventorsJinxin Fu, Kazuya Daito, Ludovic Godet
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsJinxin Fu, Kazuya Daito, Ludovic Godet
Estimating the term…
A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.
A method of optical device metrology comprising:
A method of optical device metrology comprising:
A method of optical device metrology comprising:
Dependencies are inferred from the claim text.