Apparatuses and methods for combined simultaneous analyses of materials
AssigneeInel S.A.S.
InventorHenry Pilliere
Life of this patent
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AssigneeInel S.A.S.
InventorHenry Pilliere
Estimating the term…
An analysis apparatus comprises: a moveable stage assembly; a sample holder on a top surface of the stage assembly; a first photon source and a first photon detector or detector array, the first photon source being configured to emit a first beam of photons that intercepts the surface of a sample at a first location on the sample and the first photon detector or detector array being configured to detect photons that are emitted from the first location; and a second photon source and a second photon detector or detector array, the second photon source being configured to emit a second beam of photons that intercepts the surface of the sample at a second location on the sample, the second location being spaced apart from the first location, and the second photon detector or detector array being configured to detect photons that are emitted from the second location.
An analysis apparatus, comprising:
An analysis apparatus as recited in 3, further comprising:
An analysis apparatus as recited in 14, wherein the computer readable instructions are further operable to cause the computer or electronic logic controller to cause the moveable stage assembly to again translate the sample such that the feature of interest is illuminated by the other one of the first and second X-ray beams.
A method for performing analyses of multiple locations on a sample surface, comprising:
Dependencies are inferred from the claim text.