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US 11,795,546 B2Granted
Substrate liquid processing apparatus, substrate liquid processing method and recording medium
AssigneeTokyo Electron Limited
InventorsTakashi Tanaka, Keiichi Fujita, Yuichiro Inatomi
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Abstract
A substrate processing apparatus includes a substrate holder configured to horizontally hold and rotate a substrate which has a recess and a base metal layer exposed from a bottom surface of the recess; and a pre-cleaning liquid supply configured to supply a pre-cleaning liquid such as dicarboxylic acid or tricarboxylic acid onto the substrate being held and rotated by the substrate holder, to thereby pre-clean the base metal layer. A temperature of the pre-cleaning liquid on the substrate is equal to or higher than 40° C.
Claims7
A substrate liquid processing method, comprising:
- horizontally holding and rotating a substrate which has a recess and a base metal layer exposed from a bottom surface of the recess;
- supplying a first pre-cleaning liquid onto the substrate to accelerate oxidation of the base metal layer, the first pre-cleaning liquid being an alkaline cleaning liquid;
- and
- after the supplying of the first pre-cleaning liquid, pre-cleaning the base metal layer by supplying a second pre-cleaning liquid onto the substrate being rotated, the second pre-cleaning liquid being dicarboxylic acid or tricarboxylic acid,
- wherein a temperature of the second pre-cleaning liquid on the substrate is equal to or higher than 40º C.
2 more elements
Dependencies are inferred from the claim text.