Liquid filter apparatus for gas/solid separation for semiconductor processes
AssigneeEdwards Vacuum LLC
InventorImad Mahawili
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Abstract
A liquid filter apparatus for gas/solid separation includes a housing with a filter chamber, a semiconductor process gas inlet, and a process gas outlet. The filter chamber forms a liquid reservoir, and the semiconductor process gas inlet and the process gas outlet are in communication with the filter chamber. The housing further includes a filter liquid inlet and a filter liquid outlet, which are in communication with the liquid reservoir for delivering and removing filter fluid, respectively, to and from the liquid reservoir.
Claims14
A liquid filter apparatus for gas/solid separation for a semiconductor processing system, the semiconductor processing system including a semiconductor processing chamber and a vacuum pump, said filter apparatus comprising:
- a housing having a filter chamber, a semiconductor process gas inlet configured for fluid communication to a waste output of the semiconductor processing chamber, and a process gas outlet configured for fluid communication with the vacuum pump, said filter chamber forming a liquid reservoir, and said semiconductor process gas inlet and said process gas outlet in communication with said filter chamber wherein said filter chamber is under a vacuum, and wherein said housing includes a gas exhaust chamber;
- a filter liquid inlet and a filter liquid outlet in fluid communication with said liquid reservoir for delivering and removing filter fluid, respectively, to and from said liquid reservoir;
- and
- a feed tube, said feed tube being in communication with said semiconductor process gas inlet and extending into said liquid reservoir to directly inject a process gas flowing through said semiconductor process gas inlet into the filter fluid in the liquid reservoir,
- wherein said housing includes an internal conduit extending through the liquid reservoir in fluid communication with said filter chamber and said gas exhaust chamber to direct a flow of a filtered process gas from said filter chamber to said gas exhaust chamber.
Dependencies are inferred from the claim text.