Extreme ultraviolet light generation system and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating extreme ultraviolet light in an extreme ultraviolet light generation system;
• emitting the extreme ultraviolet light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the extreme ultraviolet light in the exposure apparatus to manufacture an electronic device,
• the extreme ultraviolet light generation system including:
• a target supply unit configured to supply a target substance to a first predetermined region;
• a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region;
• a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region;
• an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region;
• and
• a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with extreme ultraviolet light generated in an extreme ultraviolet light generation system;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the extreme ultraviolet light generation system including:
• a target supply unit configured to supply a target substance to a first predetermined region;
• a laser system configured to output pulse laser light to be radiated to the target substance in the first predetermined region;
• a first sensor configured to detect an arrival timing at which the target substance has reached a second predetermined region between the target supply unit and the first predetermined region;
• an optical adjuster arranged on an optical path of the pulse laser light between the laser system and the first predetermined region;
• and
• a processor configured to control transmittance of the pulse laser light through the optical adjuster based on the arrival timing.