Image sensor
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYuichiro Yamashita, Chun-Hao Chuang, Hirofumi Sumi
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Abstract
Image sensor structures are provided. The image sensor structure includes a substrate and a light-sensing region formed in the substrate. The image sensor structure further includes a first isolation structure surrounding the light sensing region and having an opening region in a top view and a second isolation structure formed in the substrate. In addition, the second isolation structure surrounds the light-sensing region and vertically overlaps both the opening region and the first isolation structure. The image sensor structure further includes a first gate structure formed over the substrate and overlapping the opening region, the first isolation structure, and the second isolation structure.
Claims20
An image sensor structure, comprising:
- a substrate;
- a light-sensing region formed in the substrate;
- a first isolation structure surrounding the light sensing region and having an opening region in a top view;
- a second isolation structure formed in the substrate, wherein the second isolation structure surrounds the light-sensing region and vertically overlaps both the opening region and the first isolation structure;
- a first gate structure formed over the substrate and overlapping the opening region, the first isolation structure, and the second isolation structure.
An image sensor structure, comprising:
- a substrate;
- a light-sensing region formed in the substrate;
- a first isolation structure formed at a first side of the substrate;
- a second isolation structure formed at a second side of the substrate and laterally surrounding the light-sensing region;
- and
- a storage node formed at the first side of the substrate,
- wherein the second isolation structure has a first sidewall surface coincident with a first surface, and the storage node laterally extending at opposite sides of the first surface.
An image sensor structure, comprising:
- a substrate;
- a light-sensing region formed in the substrate;
- a first isolation structure surrounding the light sensing region at a first side of the substrate and having an opening region in a top view;
- a second isolation structure encircling the light-sensing region at a second side of the substrate;
- a first gate structure formed over the first side of the substrate;
- and
- a light shielding layer formed at the second side of the substrate,
- wherein the first gate structure vertically overlaps the opening region, the first isolation structure, the second isolation structure, and the light shielding layer.
Dependencies are inferred from the claim text.