Methods for reflector film growth
AssigneeApplied Materials, Inc.
InventorsLuping Li, Jacqueline S. Wrench, Wen Ting Chen, Yixiong Yang, In Seok Hwang, Shih Chung Chen, Srinivas Gandikota
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Abstract
Methods and apparatus for forming reflector films are described A liner is formed on a substrate surface followed by formation of the reflector layer so that there is no oxygen exposure between liner and reflector layer formation. In some embodiments, a high aspect ratio structure is filled with a reflector material by partially filling the structure with the reflector material while growth is inhibited at a top portion of the structure, reactivating the top portion of the substrate and then filling the structure with the reflector material.
Claims17
A method of forming a reflector film stack, the method comprising:
- forming a conformal liner on a substrate having at least one structure formed therein, the at least one structure having a bottom and sidewalls;
- exposing the substrate to a growth inhibitor to deactivate a top portion of the substrate;
- forming a reflector layer on the liner within the at least one structure to an inhibited thickness;
- reactivating the top portion of the substrate;
- and
- filling the at least one structure with the reflector layer.
A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing tool, causes the processing tool to perform operations of:
- depositing a conformal liner on a substrate in a first process chamber connected to a central transfer station having a robot therein;
- moving the substrate from the first process chamber to a second process chamber connected to the central transfer station so that the substrate is not exposed to oxygen;
- exposing the substrate to a growth inhibitor in one or more of the first process chamber, the central transfer station or the second process chamber;
- forming a reflector layer on the liner in the second process chamber;
- and
- exposing the substrate to a reactivating agent.
Dependencies are inferred from the claim text.