Methods for depositing gap filling fluids and related systems and devices

A method of filling a gap comprising:

• introducing in a reactor chamber a substrate provided with a gap, the gap comprising a recess and a lateral space extending substantially laterally from the recess;
• introducing a precursor into the reactor chamber;
• introducing a co-reactant into the reactor chamber;
• and,
• generating a plasma in the reactor chamber;
• whereby the precursor and the co-reactant react to form a gap filling fluid that at least partially fills the recess and the lateral space of the gap,
• wherein the method comprises a plurality of cycles, a cycle comprising a gap filling fluid deposition step and a curing step, wherein the curing step comprises subjecting the substrate to a direct plasma;
• and
• wherein the curing step comprises subjecting the substrate to a micro pulsed plasma comprising a plurality of micro pulse cycles, a micro pulse cycle comprising a plasma on pulse and a plasma off pulse.