Plasma processing assembly using pulsed-voltage and radio-frequency power

A plasma processing chamber, comprising:

• a substrate support assembly comprising a first electrode that is disposed a first distance from a substrate supporting surface of the substrate support assembly;
• a first pulsed-voltage waveform generator electrically coupled to the first electrode;
• a radio frequency generator electrically coupled to a second electrode of the plasma processing chamber;
• and
• a controller comprising a memory that includes computer program instructions stored therein, and the computer program instructions when executed by a processor of the controller cause:
• a delivery, by use of the radio frequency generator, of a series of radio frequency pulses to the second electrode, wherein
• the series of radio frequency pulses comprise a first radio frequency pulse and a second radio frequency pulse,
• the first radio frequency pulse comprises a first radio frequency power level and a first radio frequency pulse duration, and
• the second radio frequency pulse comprises a second radio frequency power level and a second radio frequency pulse duration, and
• a delivery, by use of the first pulsed-voltage waveform generator, of a series of pulsed voltage waveform bursts that comprise a first voltage waveform that is established at the first electrode, wherein
• the series of pulsed voltage waveform bursts comprise a first pulsed voltage waveform burst and a second pulsed voltage waveform burst that comprise a first burst duration and a second burst duration, respectively,
• the first pulsed voltage waveform burst comprises a first portion of the first voltage waveform that comprises a series of voltage pulses that comprise a first voltage pulse phase and a second voltage pulse phase, and
• the second pulsed voltage waveform burst comprises a second portion of the first voltage waveform that comprises a series of voltage pulses that comprise a first voltage pulse phase and a second voltage pulse phase, and
• during the second voltage pulse phase of the series of voltage pulses of the first and the second portion of the first voltage waveforms the first pulsed-voltage waveform generator establishes a negative voltage at the first electrode.