Method and chip for biometric characteristic acquisition, and computer readable storage medium

A chip for biometric characteristic acquisition, comprising:

• a processing unit and a storage unit connected to the processing unit, wherein the storage unit stores instructions executable by the processing unit, and the instructions are executed by the processing unit to enable the processing unit to perform a method for biometric characteristic acquisition, wherein the method comprises:
• acquiring a plurality of configuration parameters, wherein the plurality of configuration parameters include a first exposure duration, parameters defining a first region and a target photosensitive value, wherein the first region is a local region in a photosensitive region of the chip for biometric characteristic acquisition;
• exposing the first region according to the first exposure duration, and acquiring a photosensitive value of the first region;
• determining a second exposure duration required to acquire the target photosensitive value in the photosensitive region according to the photosensitive value of the first region and the first exposure duration;
• and
• acquiring a biometric image according to the second exposure duration;
• wherein the plurality of configuration parameters further include one or both of an upper limit duration corresponding to the photosensitive region and a lower limit duration corresponding to the photosensitive region, and the upper limit duration and the lower limit duration satisfy the following relationship:
• T2_max=T0+T0*a1
• T2_min=T0−T0*a2,
• wherein T0 is a default exposure duration when the terminal leaves a factory, T2 max is the upper limit duration, T2 min is the lower limit duration, a2 is greater than or equal to a1, and values of a1 and a2 range as follows:
• 10%≤a1≤30%, and 30%≤a2≤50%;
• and
• wherein acquiring the biometric image according to the second exposure duration comprises:
• acquiring the biometric imam according to the upper limit duration in response to the plurality of configuration parameters further including the upper limit duration and the second exposure duration being longer than the upper limit duration;
• and
• acquiring the biometric imam according to the lower limit duration in response to the plurality of configuration parameters further including the lower limit duration and the second exposure duration being shorter than the lower limit duration.

A terminal comprising a chip for biometric characteristic acquisition, the chip comprising a processing unit and a storage unit connected to the processing unit, wherein the storage unit stores instructions executable by the processing unit, and the instructions are executed by the processing unit to enable the processing unit to perform a method for biometric characteristic acquisition, wherein the method comprises:

• acquiring a plurality of configuration parameters, wherein the plurality of configuration parameters include a first exposure duration, parameters defining a first region and a target photosensitive value, wherein the first region is a local region in a photosensitive region of the chip for biometric characteristic acquisition;
• exposing the first region according to the first exposure duration, and acquiring a photosensitive value of the first region;
• determining a second exposure duration required to acquire the target photosensitive value in the photosensitive region according to the photosensitive value of the first region and the first exposure duration;
• and
• acquiring a biometric image according to the second exposure duration;
• wherein the plurality of configuration parameters further include one or both of an upper limit duration corresponding to the photosensitive region and a lower limit duration corresponding to the photosensitive region, and the upper limit duration and the lower limit duration satisfy the following relationship:
• T2_max=T0+T0*a1
• T2_min=T0−T0*a2,
• wherein T0 is a default exposure duration when the terminal leaves a factory, T2 max is the upper limit duration, T2 min is the lower limit duration, a2 is greater than or equal to a1, and values of a1 and a2 range as follows:
• 10%≤a1≤30%, and 30%≤a2≤50%;
• and
• wherein acquiring the biometric image according to the second exposure duration comprises:
• acquiring the biometric image according to the upper limit duration in response to the plurality of configuration parameters further including the upper limit duration and the second exposure duration being longer than the upper limit duration;
• and
• acquiring the biometric image according to the lower limit duration in response to the plurality of configuration parameters further including the lower limit duration and the second exposure duration being shorter than the lower limit duration.