Method for generating layout diagram including wiring arrangement

A method of generating a layout diagram of a wire routing arrangement in a multi-patterning context having masks, the layout diagram being stored on a non-transitory computer-readable medium and organized into rows, each row extending in a first direction, each row having first and second boundaries relative to a second direction perpendicular to the first direction, the method comprising:

• placing, relative to a given one of the masks, a given cut pattern at a first candidate location over a corresponding portion of a given conductive pattern in a metallization layer;
• and
• determining that the first candidate location would result in formation of a non-circular group having the given cut pattern included therein which thereby violates a design rule, the determining being performed on a real-time basis;
• and
• the non-circular group further including one or more other cut patterns at one or more locations over one or more corresponding portions of one or more other conductive patterns in the metallization layer;
• for first and second ones of the given cut pattern and the one or more other cut patterns in the non-circular group which abut corresponding first and second boundaries of the row and so represent corresponding first and second border patterns, the determining whether the first candidate location violates a design rule includes checking whether a first circumstance is true;
• the first circumstance being:
• the first and second boundaries are the same;
• and
• a tally of cut patterns in the non-circular group is an even number;
• and
• temporarily preventing placement of the given cut pattern in the metallization layer at the first candidate location until a correction is made which does not violate the design rule.

A method of generating a layout diagram of a wire routing arrangement in a multi-patterning context having masks, the layout diagram being stored on a non-transitory computer-readable medium and organized into rows, each row extending in a first direction, the method comprising:

• placing, relative to a given one of the masks, a given cut pattern at a first candidate location over a corresponding portion of a given conductive pattern in a metallization layer;
• determining that the first candidate location results in a cyclic group which violates a design rule, the cyclic group including one or more other cut patterns at one or more locations over one or more corresponding portions of one or more other conductive patterns in the metallization layer, the determining including:
• checking whether the given cut pattern and the one or more other cut patterns in the cyclic group are dispersed across the rows such that the cyclic group is a multi-row cyclic group;
• and
• checking whether a tally of cut patterns in the cyclic group is an odd number;
• and
• temporarily preventing placement of the given cut pattern in the metallization layer at the first candidate location until a correction is made which avoids violating the design rule.