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US 11,774,852 B2Granted
Photosensitive resin composition and display device
AssigneeDuk San Neolux Co., Ltd.
InventorsJun Bae, Chang Min Lee, Jun Ki Kim, Jae Hyun Lim, Soung Yun Mun
Life of this patent
Estimating the term…
Abstract
A photosensitive resin composition capable of reducing residues upon the development thereof, reducing melting flow, and forming a pattern layer having a high taper angle, by containing two or more kinds of different cardo binders; and a display device including a pattern layer containing a polymerization reaction product of the photosensitive resin composition.
Claims12
A photosensitive resin composition comprising:
- (A) two or more kinds of cardo binders containing a repeating unit represented by Formula 1 below and having different molecular weights;
- (B) a reactive unsaturated compound;
- (C) a pigment;
- (D) an initiator;
- and (E) a solvent:
- 1) “*” indicates a portion where a bond is linked to the repeating unit;
- 2) R1 and R2 are each independently selected from the group consisting of deuterium, a halogen group, a C6-C60 aryl group, a C2-C60 heterocyclic group containing at least one heteroatom of O, N, S, Si, and P, a fused ring group of a C3-C60 aliphatic ring and a C6-C60 aromatic ring, a C1-C60 alkyl group, a C2-C60 alkenyl group, a C2-C60 alkynyl group, a C1-C60 alkoxyl group, and a C6-C30 aryloxy group;
- 3) R3 to R6 are each independently selected from the group consisting of hydrogen, deuterium, a halogen group, a C6-C60 aryl group, a C2-C60 heterocyclic group containing at least one heteroatom of O, N, S, Si, and P, a fused ring group of a C3-C60 aliphatic ring and a C6-C60 aromatic ring, a C1-C60 alkyl group, a C2-C60 alkenyl group, a C2-C60 alkynyl group, a C1-C60 alkoxyl group, and a C6-C30 aryloxy group;
- 4) R7 is selected from the group consisting of hydrogen, deuterium, a C1-C60 alkyl group, a C2-C60 alkenyl group, an acrylic group, and a methacrylic group;
- 5) M and n are each independently an integer of 0 to 4, wherein adjacent R's may be linked to each other to form a monocyclic or polycyclic ring when m is 2 or greater, and Res may be linked to each other to form a monocyclic or polycyclic ring when n is 2 or greater;
- 6) X2 is an acid anhydride residue or acid dianhydride residue;
- 7) X1 is represented by Formula 2 below;
- 8) Y1 and Y2 are each independently selected from the group consisting of hydrogen, deuterium, Formula 3 below;
- and Formula 4 below;
- 9) R8 and R9 are each independently selected from the group consisting of deuterium, a halogen group, a C6-C60 aryl group, a C2-C60 heterocyclic group containing at least one heteroatom of O, N, S, Si, and P, a fused ring group of a C3-C60 aliphatic ring and a C6-C60 aromatic ring, a C1-C60 alkyl group, a C2-C60 alkenyl group, a C2-C60 alkynyl group, a C1-C60 alkoxyl group, and a C2-C60 alkenyl group;
- 10) o and p are each independently an integer of 0 to 4, wherein adjacent R8's may be linked to each other to form a monocyclic or polycyclic ring when o is 2 or greater;
- and R9's may be linked to each other to form a monocyclic or polycyclic ring when p is 2 or greater;
- 11) L1 to L3 are each independently selected from the group consisting of a single bond, a C1-C60 alkylene group, and a C6-C60 arylene group;
- 12) R10 to R12 are each independently selected from the group consisting of hydrogen, deuterium, a halogen group, a C6-C60 aryl group, a C2-C60 heterocyclic group containing at least one heteroatom of O, N, S, Si, and P, a fused ring group of a C3-C60 aliphatic ring and a C6-C60 aromatic ring, a C1-C60 alkyl group, and a C1-C60 alkoxyl group;
- 13) R13 is either a methyl group or an ethyl group;
- 14) R14 is either a methoxy group or an ethoxy group;
- 15) Z1 is S or O;
- and
- 16) q and r are each independently an integer of 0 to 3, and q+r=3.
21 more elements
Dependencies are inferred from the claim text.