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US 11,769,986 B2Granted
Siloxane mitigation for laser systems
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsBryan Lochman, Wang-Long Zhou, Francisco Villarreal-Saucedo, Bien Chann
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Abstract
In various embodiments, the concentration and deposition of siloxane materials within components of laser systems, such as laser resonators, is reduced or minimized utilizing mitigation systems that may also supply gas having low siloxane levels into multiple different components in series or in parallel.
Claims28
A laser apparatus comprising:
- a laser system comprising a plurality of enclosed components, at least one of the components comprising one or more beam emitters therewithin;
- a plurality of gas inlets, each gas inlet being configured to permit ingress of gas into a different one of the enclosed components of the laser system;
- an inlet manifold, different from the plurality of enclosed components, fluidly coupled to the plurality of gas inlets;
- a pump, different from the plurality of enclosed components, for supplying gas to the inlet manifold;
- and
- a siloxane-mitigation system, different from the plurality of enclosed components, configured to remove siloxanes from gas supplied to the inlet manifold by the pump.
3 more elements
Dependencies are inferred from the claim text.