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US 11,769,982 B2Granted
Lithography system bandwidth control
AssigneeCymer, Inc.
InventorTanuj Aggarwal
Life of this patent
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Abstract
Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates.
Claims15
Apparatus comprising:
- a laser configured to operate at a first repetition rate selected from a plurality of repetition rates at which the laser is capable of operating, the laser having a first chamber and a second chamber;
- a comparison module adapted to determine if the first repetition rate is substantially the same as a second repetition rate used immediately prior by the laser;
- and
- a control module adapted to alter a timing parameter of the laser relating to a timing of firing in the second chamber relative to a timing of firing in the first chamber if the comparison module determines that the first repetition rate is not substantially the same as the second repetition rate.
1 more element
Apparatus comprising:
- a laser having a first chamber and a second chamber and configured to operate in accordance with a timing parameter relating to a timing of firing in the second chamber relative to a timing of firing in the first chamber;
- a monitor module adapted to determine whether an amount by which the timing parameter differs from a reference value of the timing parameter by more than a predetermined amount;
- and
- a timing parameter adjusting module adapted to adjust the timing parameter based at least partially on the amount by which the timing parameter differs from the reference value of the timing parameter.
1 more element
Apparatus comprising:
- a laser configured to operate at a first repetition rate selected from a plurality of repetition rates at which the laser is capable of operating;
- a comparison module adapted to determine if the first repetition rate is substantially the same as a second repetition rate used immediately prior by the laser;
- a control module adapted to alter a control parameter of the laser if the comparison module determines that the first repetition rate is not substantially the same as the second repetition rate;
- and
- a timing module adapted to determine an amount of elapsed time since the second repetition rate used was substantially the same as the first repetition rate;
- and wherein the control module is additionally adapted to alter the control parameter at least partially on the basis of the amount of elapsed time as determined by the timing module.
3 more elements
Apparatus comprising:
- a laser configured to operate in accordance with a control parameter;
- a monitor module adapted to determine whether an amount by which the control parameter differs from a reference value of the control parameter by more than a predetermined amount;
- and
- a control parameter adjusting module adapted to adjust the control parameter based at least partially on the amount by which the control parameter differs from the reference value of the control parameter,
- wherein the control parameter adjusting module is adapted to adjust the control parameter to make it closer to the reference value, if the monitor module determines that the control parameter differs from the reference value by more than the predetermined amount so that the control parameter differs from the reference value by less than the predetermined amount, and
- wherein the control parameter is an adjustable bandwidth offset for the laser.
3 more elements
Apparatus comprising:
- a laser configured to operate in accordance with a control parameter;
- a monitor module adapted to determine whether an amount by which the control parameter differs from a reference value of the control parameter by more than a predetermined amount;
- and
- a control parameter adjusting module adapted to adjust the control parameter based at least partially on the amount by which the control parameter differs from the reference value of the control parameter,
- wherein the control parameter is an adjustable bandwidth offset for the laser.
2 more elements
Dependencies are inferred from the claim text.