Showerhead assembly and method of servicing assembly for semiconductor manufacturing

An apparatus, comprising:

• a showerhead disposed over a wafer stage within a cleaning chamber, the showerhead configured to eject cleaning material through the showerhead towards a cleaning surface of a wafer;
• an adjustable distributor assembly disposed within the showerhead and configured to provide selectively adjustable openings through which the cleaning material passes, the adjustable distributor assembly including:
• a base sheet including base openings;
• and
• a plurality of control sheets including control openings and configured to slidably mate with the base sheet to provide selectively adjustable openings;
• a feedback controller configured to adjust the selectively adjustable openings of the adjustable distributor assembly, and
• a plurality of control segments positioned between the base openings of the base sheet,
• wherein each of the plurality of control segments includes control openings that have a different diameter from each other.

An apparatus for manufacturing a semiconductor device, comprising:

• a chamber;
• a showerhead disposed in the chamber and coupled to a gas source;
• an adjustable distributor assembly having a base sheet comprising a plurality of openings and a control sheet comprising a plurality of openings, the adjustable distributor assembly being disposed to face the showerhead;
• a controller configured to move at least one of the base sheet or the control sheet such that an overlapping amount between the plurality of openings of the base sheet and the plurality of openings of the control sheet changes, and
• a plurality of control segments positioned between the plurality of openings of the base sheet,
• wherein each of the plurality of control segments includes control openings that have a different diameter from each other.