Method of determining control parameters of a device manufacturing process

A computer program product comprising a non-transitory computer-readable medium having machine-readable instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:

• obtain an image of at least part of a substrate, wherein the image comprises at least one feature comprised by a device being manufactured in a layer on the substrate by a manufacturing process that comprises a lithographic process of imaging a portion of a design layout onto the substrate using a lithographic apparatus and one or more further processes in the manufacturing process of the device;
• obtain a layout of features associated with a previous layer adjacent to the layer on the substrate;
• calculate one or more image-related metrics in dependence on:
• 1) a contour determined from the image comprising the at least one feature and 2) the layout;
• determine one or more control parameters of the lithographic apparatus and/or the one or more further processes in the manufacturing process of the device in dependence on the one or more image-related metrics, wherein at least one of the control parameters is determined to modify the geometry of the contour in order to improve the one or more image-related metrics.