System and method for performing extreme ultraviolet photolithography processes

A system, comprising:

• an extreme ultraviolet radiation generation chamber including an interior surface;
• a plurality of mass flow controllers each configured to receive a buffer fluid from a fluid source;
• a fluid distributor including:
• a plurality of fluid inlets each coupled to a respective one of the mass flow controllers and configured to receive the buffer fluid from the mass flow controller;
• and
• a plurality of outlets configured to supply the buffer fluid into the extreme ultraviolet radiation generation chamber;
• and
• a plurality of fluid chambers separated from each other and each coupling a respective one of the inlets to a respective one of the outlets;
• and
• a plurality of adjustable director vanes each positioned adjacent to a respective outlet and configured to direct a first portion of the buffer fluid toward a collector mirror and to direct a second portion of the buffer fluid toward the interior surface.

A method, comprising:

• generating, in an extreme ultraviolet radiation generation chamber, extreme ultraviolet radiation;
• reflecting the extreme ultraviolet radiation with a collector mirror;
• passing a buffer fluid from a plurality of mass flow controllers to each of a plurality of fluid chambers separated from each other;
• flowing the buffer fluid from each fluid chamber into the extreme ultraviolet generation chamber via a respective fluid outlet;
• operating a plurality of adjustable director vanes each positioned adjacent to a respective outlet and configured to divide a flow of the buffer fluid to different areas of the extreme ultraviolet radiation chamber.