Chemical liquid, chemical liquid container, and method for treating substrate
AssigneeFUJIFILM Corporation
InventorAtsushi Mizutani
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Abstract
The present invention provides a chemical liquid that has an excellent ruthenium dissolving ability and leaves small amounts of residual ruthenium and sodium, a chemical liquid container, and a method for treating a substrate. The chemical liquid according to an embodiment of the present invention is a chemical liquid used for removing a ruthenium-containing substance on a substrate. The chemical liquid contains hypochlorous acid or a salt thereof and bromic acid or a salt thereof, in which a content of the hypochlorous acid or a salt thereof is 0.1% to 9.0% by mass with respect to a total mass of the chemical liquid, and a content of the bromic acid or a salt thereof is 0.001 to 15.0 ppm by mass with respect to the total mass of the chemical liquid.
Claims20
A chemical liquid used for removing a ruthenium-containing substance on a substrate, comprising:
- hypochlorous acid or a salt thereof;
- and
- bromic acid or a salt thereof,
- wherein a content of the hypochlorous acid or a salt thereof is 0.1% to 9.0% by mass with respect to a total mass of the chemical liquid, and
- a content of the bromic acid or a salt thereof is 0.001 to 15.0 ppm by mass with respect to the total mass of the chemical liquid.
Dependencies are inferred from the claim text.