Gas-dispersing apparatus for multiple chemical resources
AssigneePiotech Inc.
InventorsHuaqiang Tan, Gi-Youl Kim, Zhuo Wang, Xin Su
Life of this patent
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AssigneePiotech Inc.
InventorsHuaqiang Tan, Gi-Youl Kim, Zhuo Wang, Xin Su
Estimating the term…
The invention discloses a gas dispensing apparatus for multiple chemical resources, including: a showerhead assembly having at least two layers of board bodies and a gas mixing chamber defined at a center of the at least two layers of board bodies, and the gas mixing chamber having multiple holes defined thereon; and a pipeline assembly mounted to the showerhead assembly and having a stepped body defining at least two pipelines, the stepped body being configured to connect to the at least two layers of the board bodies to define at least two gas cavities, each of the gas cavities communicating with the corresponding one of the pipelines, each of the gas cavities communicating with the holes defined on the gas mixing chamber.
A gas dispensing apparatus for multiple chemical resources, comprising:
Dependencies are inferred from the claim text.