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US 11,767,336 B2Granted
Organometallic cluster photoresists for EUV lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHsu-Kai Chang, Chi-Ming Yang, Jui-Hsiung Liu, Jui-Hung Fu, Hsin-Yi Wu
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Abstract
The present disclosure is directed to organotin cluster compounds having formula (I) and their use as photoresists in extreme ultraviolet lithography processes.
Claims20
A compound having the following structure:
- wherein:
- R1 is alkyl or aryl;
- Y is carbonyl or alkylene;
- and
- R2 is aryl or heteroaryl.
2 more elements
A photoresist composition, comprising:
- a solvent;
- and
- a compound having the following structure:
- wherein:
- R1 is alkyl or aryl;
- Y is carbonyl or alkylene;
- and
- R2 is aryl or heteroaryl.
5 more elements
A photoresist layer comprising a compound having the following structure:
- wherein:
- R1 is alkyl or aryl;
- Y is carbonyl or alkylene;
- and
- R2 is aryl or heteroaryl.
2 more elements
Dependencies are inferred from the claim text.