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US 11,766,756 B2Granted
Substrate support apparatus and substrate cleaning apparatus
AssigneeEbara Corporation
InventorMitsuru Miyazaki
Life of this patent
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Abstract
A substrate support apparatus 100 has a support part 10 for supporting a substrate W; a moving part 50 which is adapted to abut on the support part 10 and to move the support part 10 along an axis direction; a fluid pipe 60 at least a part of which is provided in the moving part 50, through which fluid flows and an outlet port 61 of which is covered by the support part 10 when the moving part 50 abuts on the support part 10; and a detection part 90 which detects a state of the fluid.
Claims10
A substrate cleaning apparatus comprising:
- a support part for supporting a substrate;
- a moving part configured to be separate from the support part in a first state, wherein the moving part is configured to move to the support part, abut the support part in a second state and move the support part along an axis direction in the second state;
- a fluid pipe at least a part of which is provided in the moving part, through which gas flows and an outlet port of which is covered by the support part when the moving part abuts on the support part in the second state;
- a detection part which detects pressure or flow rate of the gas;
- and
- a control part configured to determine whether the moving part abuts the support part in the second state when the pressure of the gas detected by the detection part increased or the flow rate of the gas detected by the detection part reduced.
3 more elements
Dependencies are inferred from the claim text.