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US 11,766,635 B2Granted
Gas recovering apparatus, semiconductor manufacturing system, and gas recovering method
AssigneeKioxia Corporation
InventorYuya Matsubara
Life of this patent
Estimating the term…
Abstract
According to one embodiment, a gas recovering apparatus includes a casing and a tube. The casing is provided with an inlet through which a gas flows in, a first outlet for discharging a first gas containing a gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas. The casing is evacuated via the first outlet. The tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas.
Claims20
A semiconductor manufacturing system, comprising:
- a semiconductor manufacturing apparatus configured to manufacture a semiconductor device by using a process gas comprising a gas to be recovered and discharge an exhaust gas generated due to manufacturing of the semiconductor device;
- a dilution device configured to dilute the exhaust gas by a diluent gas;
- a detoxifying device configured to detoxify the exhaust gas by burning the diluted exhaust gas by using an oxygen gas;
- and
- a gas recovering apparatus configured to recover the gas to be recovered from the detoxified exhaust gas, wherein
- the gas recovering apparatus comprises a casing provided with an inlet through which the detoxified exhaust gas flows in, a first outlet for discharging a first gas comprising a gas to be recovered of the detoxified exhaust gas, and a second outlet for discharging a second gas other than the first gas of the detoxified exhaust gas, and evacuated via the first outlet;
- and
- a tube provided in the casing from the inlet to the second outlet, and having a high permeability to the first gas and a low permeability to the second gas.
5 more elements
A gas recovering method, wherein
- a gas to be recovered is recovered by using a gas recovering apparatus comprising:
- a casing provided with an inlet through which a gas generated due to manufacturing of a semiconductor device flows in after the gas is diluted and detoxified, a first outlet for discharging a first gas comprising the gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas, and evacuated via the first outlet;
- and
- a tube provided in the casing from the inlet to the second outlet, and having a high permeability to the first gas and a low permeability to the second gas, and
- recovery of the gas to be recovered comprises:
- generating a pressure difference between inside and outside of the tube in such a manner that outside of the tube has a lower pressure than inside of the tube in the casing;
- and
- causing the first gas to permeate from inside to outside of the tube due to the pressure difference and to be discharged from the first outlet.
5 more elements
A gas recovering method, comprising:
- diluting an exhaust gas, the exhaust gas is generated due to manufacturing of a semiconductor device by using a process gas comprising a gas to be recovered;
- detoxifying the exhaust gas by burning the diluted exhaust gas by using an oxygen gas;
- and
- recovering the gas to be recovered from the detoxified exhaust gas by a gas recovering apparatus, wherein
- the gas recovering apparatus comprises a casing and a tube, the casing is provided with an inlet through which the detoxified exhaust gas flows in, a first outlet for discharging a first gas comprising a gas to be recovered of the detoxified exhaust gas, and a second outlet for discharging a second gas other than the first gas of the detoxified exhaust gas, and evacuated via the first outlet, and the tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas, wherein
- recovery of the gas to be recovered comprises:
- generating a pressure difference between inside and outside of the tube in such a manner that outside of the tube has a lower pressure than inside of the tube in the casing;
- and
- causing the first gas to permeate from inside to outside of the tube due to the pressure difference and to be discharged from the first outlet.
6 more elements
Dependencies are inferred from the claim text.