Ion injection into an electrostatic linear ion trap using Zeno pulsing
AssigneeDH Technologies Development Pte. Ltd.
InventorEric Thomas Dziekonski
Life of this patent
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Abstract
An ion guide defining a guide axis receives ions. The ion guide applies a potential profile that includes a pseudopotential well to the ions using an ion control field. The ion control field includes a component for restraining movement of the ions normal to the guide axis and a component for controlling the movement of the ions parallel to the guide axis. The ion guide sequentially injects the ions with the same ion energy and in decreasing order of m/z value into an ELIT aligned along an ELIT axis to focus the ions irrespective of m/z value at the same location on the ELIT axis within the ELIT at the same time by varying a magnitude of the pseudopotential well. The ELIT can trap the focused ions using in-trap potential lift or mirror-switching ion capture.
Claims15
A system for sequentially injecting ions into an electrostatic linear ion trap (ELIT) of a mass spectrometer so that ions with different mass-to-charge ratio (m/z) values are focused at a same location at a same time in the ELIT, comprising:
- an ELIT that includes
- a first set of reflectron plates with holes in the center that is aligned along an ELIT axis and
- a second set of reflection plates with holes in the center that is aligned along the ELIT axis;
- and
- an ion guide defining a guide axis that
- receives ions along the guide axis from an ion beam of a mass spectrometer,
- applies a potential profile that includes a pseudopotential well to the ions along the guide axis using an ion control field that includes a component for restraining movement of the ions normal to the guide axis and a component for controlling the movement of the ions parallel to the guide axis, and
- sequentially injects the ions into the ELIT with a same ion energy and in order of m/z value to focus the ions irrespective of m/z value at a same location on the ELIT axis within the ELIT at a same time by varying a magnitude of the pseudopotential well.
A method for sequentially injecting ions into an electrostatic linear ion trap (ELIT) of a mass spectrometer so that ions with different mass-to-charge ratio (m/z) values are focused at a same location at a same time in the ELIT, comprising:
- instructing an ion guide defining a guide axis to receive ions along the guide axis from an ion beam of a mass spectrometer using a processor;
- instructing the ion guide to apply a potential profile that includes a pseudopotential well to the ions along the guide axis using an ion control field that includes a component for restraining movement of the ions normal to the guide axis and a component for controlling the movement of the ions parallel to the guide axis using the processor, and
- instructing the ion guide to sequentially inject the ions with a same ion energy and in order of m/z value into an ELIT aligned along an ELIT axis to focus the ions irrespective of m/z value at a same location on the ELIT axis within the ELIT at a same time by varying a magnitude of the pseudopotential well using the processor.
A computer program product, comprising a non-transitory and tangible computer-readable storage medium whose contents include a program with instructions being executed on a processor to perform a method for sequentially injecting ions into an electrostatic linear ion trap (ELIT) of a mass spectrometer so that ions with different mass-to-charge ratio (m/z) values are focused at a same location at a same time in the ELIT, comprising:
- providing a system, wherein the system comprises one or more distinct software modules, and wherein the distinct software modules comprise a control module;
- instructing an ion guide defining a guide axis to receive ions along the guide axis from an ion beam of a mass spectrometer using the control module;
- instructing the ion guide to apply a potential profile that includes a pseudopotential well to the ions along the guide axis using an ion control field that includes a component for restraining movement of the ions normal to the guide axis and a component for controlling the movement of the ions parallel to the guide axis using the control module, and
- instructing the ion guide to sequentially inject the ions with a same ion energy and in order of m/z value into an ELIT aligned along an ELIT axis to focus the ions irrespective of m/z value at a same location on the ELIT axis within the ELIT at a same time by varying a magnitude of the pseudopotential well using the control module.
Dependencies are inferred from the claim text.