Precision control through stitching for material properties of textiles

A computerized system for designing a textile comprising:

• a set of non-transitory computer readable instructions configured for:
• receiving a design pattern adapted to redistribute pressure resulting from placement of a physical object on a support textile;
• developing a stitching pattern constrained by a design pattern perimeter boundary and having a stitching path,
• developing a first pattern within the stitching pattern representing a first stiffness,
• developing a second pattern within the stitching pattern represent a second stiffness wherein a first area on a modified textile defined by the first pattern is more stiff than a second area on the modified textile defined by the second pattern, and
• transmitting the stitching pattern to an embroidery machine configured to stitch the stitching pattern to provide the support textile from a base elastic textile wherein the support textile redistributes pressure from placement of a physical object on the support textile when compared to the base elastic textile.

A computerized system for manufacturing a textile comprising:

• a set of non-transitory computer readable instructions configured for:
• receiving a design pattern adapted to redistribute pressure resulting from placement of a physical object on a support textile;
• developing a stitching pattern according to the design pattern and having a stitching path,
• developing a first pattern within the stitching pattern having a first stiffness,
• developing a second pattern within the stitching pattern having a second stiffness wherein the first pattern has a higher stiffness than the second pattern the combination of the first pattern, the second pattern, and a base elastic textile is adapted to provide a modified planer stretch property of the textile, and
• transmitting the stitching pattern to an embroidery machine configured to provide the support textile by applying the stitching pattern to an elastic base textile wherein the first pattern and the second pattern combine to redistribute pressure applied by placement of a physical object on the support textile when compared to the base elastic textile.

A computerized system for manufacturing a textile comprising:

• a set of non-transitory computer readable instructions configured for:
• receiving a design pattern adapted to redistribute pressure applied by placement of a physical object on a support textile when the design pattern is applied to a base elastic textile;
• developing a stitching pattern adapted for application on a base elastic textile according to the design pattern,
• developing a first stiffness area within the stitching,
• developing a second stiffness area within the stitching pattern wherein the first stiffness area has a higher stiffness value than the second stiffness area and the stitching pattern combined with the base elastic textile is adapted to provide a modified linear stretch property support surface, and
• transmitting the stitching pattern to an embroidery machine configured to provide the support textile having the stitching pattern incorporating into the base elastic textile wherein the support textile redistributes pressure applied by the physical object on the support textile when compared to the pressure applied by the physical object on the base elastic textile.