Molybdenum(0) precursors for deposition of molybdenum films
AssigneeApplied Materials, Inc.
InventorsChandan Kr Barik, John Sudijono, Chandan Das, Doreen Wei Ying Yong, Mark Saly, Bhaskar Jyoti Bhuyan, Feng Q. Liu
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Abstract
Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be sequential or simultaneous.
Claims1
A metal coordination complex comprising molybdenum(0) and having a structure selected from the group consisting of:
- Mo(CO)n(CNMe)(6-n) wherein n is from 1 to 3, Mo(CO)n(Py)(6-n) wherein n is from 1 to 3, Mo(CO)n(SMe2)(6-n) wherein n is from 1 to 3,
- wherein n is from 1 to 3, wherein the metal coordination complex is substantially free of halogen and substantially free of a Mo-O bond, and wherein L is selected from the group consisting of a 2n-electron donor neutral monodentate ligand, a 2n-electron donor neutral bidentate ligand, a 2n-electron donor neutral tridentate ligand, and combinations thereof.
Dependencies are inferred from the claim text.