Anisotropic copoly(imide oxetane) coatings and articles of manufacture, copoly(imide oxetane)s containing pendant fluorocarbon moieties, oligomers and processes therefor

A copoly(amic acid oxetane) having the structure represented by:

• —(G—A)—(D—A)—
• wherein:
• G is represented by the formula
• —NH—R1—C(O)—O—J—C(O)—R1—HN—
• wherein:
• J is [CH2—CR2R3—CH2—O]m or
• [(CH2—CR2R3—CH2—O)p—(R6—O)q—(CH2—CR2R3—CH2—O)r] wherein R6 is a substituted or unsubstituted aliphatic or aromatic moiety of 2 to 16 carbons;
• R1 is an aliphatic or aromatic hydrocarbon moiety of 1 to 10 carbon atoms;
• R2 is —H, —F, or an alkyl of 1 to 6 carbon atoms;
• R3 is —F, —R4H(n-a)Fa, —R5—O—R4H(n-a)Fa, or —O—R4H(n-a)Fa, wherein R4 is an alkyl or ether moiety of 1 to 30 carbons, R5 is an alkyl moiety of 1 to 30 carbons, a is an integer of 3 to n, and n is twice the number of carbon atoms in the alkyl moiety plus 1;
• m is between about 4 and 500, p is between about 4 and 150, q is between about 1 and 150;
• and
• r is an integar;
• A is represented by the formula
• wherein:
• L is a hydrocarbyl-containing moiety of 2 to 100 carbon atoms, optionally containing divalent radicals selected from the group consisting of oxygen, silyl, sulfur, carbonyl, sulfonyl, phosphonyl, perfluoro, tertiary amino, and imido;
• D is represented by the formula
• —NH—Z—NH—
• wherein:
• Z is a hydrocarbyl-containing moiety of 1 to 100 carbon atoms optionally containing divalent radicals selected from the group consisting of oxygen, sulfur, silyl, carbonyl, sulfonyl, phosphonyl, perfluoro, tertiary amino, and imido.