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US 11,747,834 B2Granted
Increasing the gas efficiency for an electrostatic chuck
AssigneeApplied Materials, Inc.
InventorVijay D. Parkhe
Life of this patent
Estimating the term…
Abstract
A gas is received through an inlet. A portion of the gas is supplied to an electrostatic chuck. A portion of the gas is re-circulated through a compressor. A pressure of the second portion of the gas is increased. The second portion of the gas is stored in a gas storage.
Claims7
A system to increase the efficiency of a gas for an electrostatic chuck, comprising:
- an inlet configured to receive the gas, the gas comprising a first portion and a second portion, and the inlet configured to receive the gas having an initial pressure from about 6 torr to about 30 torr;
- a first outlet coupled to the inlet and configured to supply the first portion of the gas but not the second portion of the gas to the electrostatic chuck;
- a second outlet coupled to the first outlet and to a control valve, the control valve coupled to a compressor and coupled to a vacuum pump line, the control valve configured to be opened for a first time interval for dumping the second portion of the gas through the vacuum pump, and the control valve configured to be closed for a second time interval to re-circulate the second portion of the gas through the compressor to the inlet prior to entering the electrostatic chuck, the second time interval greater than the first time interval, wherein the first interval time is not greater than about 3 seconds, and the second interval time is about 60 seconds, and the compressor configured to increase a pressure of the second portion of the gas to match the pressure of the gas received at the inlet, the pressure of the gas received at the inlet from about 10 psi to about 25 psi, and a controller coupled to and configured to control all of the inlet, the first outlet, the control valve, and the second outlet.
Dependencies are inferred from the claim text.