Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin

A compound represented by the following formula (1):

• wherein
• A is a group having 1 to 12 carbon atoms;
• R1 is a 2n-valent group having 1 to 30 carbon atoms;
• R2 to R5 are each independently a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkynyl group having 2 to 10 carbon atoms, a thiol group, or a hydroxyl group;
• at least one R4 and/or at least one R5 is a hydroxy group and/or a thiol group;
• m2 and m3 are each independently an integer of 0 to 8;
• m4 and m5 are each independently an integer of 0 to 9;
• n is an integer of 1 to 4;
• and
• p2 to p5 are each independently an integer of 0 to 2.