Method for metal layer formation
AssigneeOrelTech Ltd.
InventorsNatalia Zamoshchik, Konstantin Livanov, Yana Sheynin
Life of this patent
Estimating the term…
Abstract
A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
Claims30
A method for forming a crystalline metal layer on a three-dimensional (3D) substrate, comprising:
- applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a mixture of a spreading liquid having a surface tension between 10 and 40 millinewton per meter (mN/m) and a structuring liquid having a dynamic viscosity between 10-1000 centipoise (cP) and a vapor pressure between 0-100 pascals (Pa);
- and
- exposing the crystal growth ink to low temperature radio frequency (RF) plasma irradiation in a vacuum environment to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters;
- wherein the metal ionic precursor is HAuCl4 with a concentration ranging from 5 wt. % and 20 wt. %;
- wherein the structuring liquid comprises at least one of Dipropylene glycol methyl ether with a concentration of 16 wt. % and Ethylene glycol with a concentration of 41 wt. %;
- wherein the spreading liquid comprises Propanol with a concentration of 32 wt. %;
- and
- wherein the set of predefined exposure parameters includes RF frequency of 13.56 MHz, 150 W of power, 25 SCCM gas flow rate, and the pressure within a chamber is 0.6 mbar;
- resulting in a continuous layer of gold nanoparticles ranging from 20 to 100 nm in size.
A method for forming a crystalline metal layer on a three-dimensional (3D) substrate, comprising:
- applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a mixture of a spreading liquid having a surface tension between 10 and 40 millinewton per meter (mN/m) and a structuring liquid having a dynamic viscosity between 10-1000 centipoise (cP) and a vapor pressure between 0-100 pascals (Pa);
- and
- exposing the crystal growth ink to low temperature radio frequency (RF) plasma irradiation in a vacuum environment to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters;
- wherein the metal ionic precursor is AgNO3 with a concentration ranging from 0.1 wt. % and 50 wt. %;
- wherein the structuring liquid comprises at least one of Propylene glycol with a concentration ranging from 20 wt. % to 50 wt. % and Ethylene glycol with a concentration ranging from 15 wt. % to 60 wt. %,
- wherein the spreading liquid comprises at least one of Ethanol with a concentration ranging from
- 2.5 wt. % to 40 wt. %, Propanol with a concentration of 32 wt. %, and Propylene glycol methyl ether with a concentration ranging from 4.2 wt. % to 32 wt. %;
- and
- wherein the set of predefined exposure parameters includes RF frequency of 13.56 MHz, 50-150 W of power, 20-40 SCCM gas flow rate, and the pressure within a chamber is 0.5-0.6 mbar;
- resulting in a continuous layer of silver nanoparticles ranging from 20 to 100 nm in size.
Dependencies are inferred from the claim text.