Charged particle microscope scan masking for three-dimensional reconstruction
AssigneeFEI Company
InventorsPavel Potocek, Maurice Peemen, Bert Henning Freitag
Life of this patent
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AssigneeFEI Company
InventorsPavel Potocek, Maurice Peemen, Bert Henning Freitag
Estimating the term…
Disclosed herein are CPM support systems, as well as related apparatuses, methods, computing devices, and computer-readable media. For example, in some embodiments, a charged particle microscope computational support apparatus may include: first logic to, for each angle of a plurality of angles, receive an associated image of a specimen at the angle, and generate an associated scan mask based on one or more regions-of-interest in the associated image; second logic to, for each angle of the plurality of angles, generate an associated data set of the specimen by processing data from a scan, in accordance with the associated scan mask, by a charged particle microscope of the specimen at the angle; and third logic to provide, for each angle of the plurality of angles, the associated data set of the specimen to reconstruction logic to generate a three-dimensional reconstruction of the specimen.
A charged particle microscope computational support apparatus, comprising:
A charged particle microscope computational support apparatus, comprising:
A charged particle microscope computational support apparatus, comprising:
A charged particle microscope computational support apparatus, comprising:
Dependencies are inferred from the claim text.