Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Yukako Anryu, Koji Ichikawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Yukako Anryu, Koji Ichikawa
Estimating the term…
Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same: wherein R1 represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R2, R3 and R4 each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X0 represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO2—.
A carboxylate represented by formula (I):
Dependencies are inferred from the claim text.