Injection remediation systems and methods
AssigneeGregg Drilling, LLC
InventorJohn Gregg
Life of this patent
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Abstract
This invention relates generally to injection remediation systems and methods. In one embodiment, an injection remediation system includes, but is not limited to, at least one reservoir configured to contain material; at least one load sensor supporting the at least one reservoir; at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material; and at least one processor configured to determine an amount of the material sourced from the at least one reservoir based at least partly on weight information obtained from the at least one load sensor.
Claims19
An injection remediation system comprising:
- at least one reservoir configured to contain material;
- at least one load sensor supporting the at least one reservoir;
- at least one level sensor incorporated with the at least one reservoir;
- at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material;
- and
- at least one processor configured to (i) determine density of the material based at least partly on weight obtained from the at least one load sensor and volume obtained using the at least one level sensor and (ii) control the at least one dosing pump based at least partly on the density of the material.
An injection remediation system comprising:
- a first reservoir configured to contain first material, the first reservoir including a first load sensor and a level sensor;
- a first dosing pump for sourcing the first material;
- a second reservoir configured to contain second material, the second reservoir including a second load sensor;
- a second dosing pump for sourcing the second material;
- at least one processor configured to control the first dosing pump and the second dosing pump to maintain a specified ratio between the first material and the second material.
An injection system comprising:
- at least one reservoir configured to contain material;
- at least one load sensor supporting the at least one reservoir;
- at least one level sensor included with the at least one reservoir;
- at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material;
- and
- at least one processor configured to control the at least one dosing pump at least partly using density information that is dynamically determined using the at least one level sensor and the at least one load sensor.
Dependencies are inferred from the claim text.