Color resist material, filter, and preparation method thereof
AssigneeTcl China Star Optoelectronics Technology Co., Ltd.
InventorsLin Al, Hsiaohsien Chen
Life of this patent
Estimating the term…
Abstract
The present application discloses a color resist material, a filter, and a preparation method thereof. The color resist material is a trimer structure formed by polymerizing phthalocyanine dyes, wherein groups with double bonds are introduced on the phthalocyanine dyes to construct a three-molecule complex by a complexing agent, and the phthalocyanine dyes are connected by the double bonds to form a trimer structure. The color resist material with the trimer structure is stably stored in a photoresist liquid and has excellent solvent resistance, while maintains good solubility. Accordingly, a filter made of the color resist material has high transmittance and good optical performance.
Claims20
A color resist material, having a chemical structure represented by Formula (1):
- wherein each of chemical structures U1, U2 and U3 is represented by Formula (1-2):
- wherein Z has an end connected to oxygen and another end connected to a double bond in Formula (1), Z is selected from alkylene and —YOX—, where X is selected from alkylene, and Y is selected from arylene, and
- wherein in Formula (1), a benzene ring is also connected with other functional groups, each of the other functional groups is independently selected from one of hydrogen, halogen, alkyl, alkoxy, aryl, aryloxy, and a heterocyclic group, and M represents a metal or a metal halide.
A method of preparing a color resist material, which comprises the following steps:
- dissolving a phthalocyanine dye represented by one of Formula (8), Formula (9), and Formula (10) in a first solvent;
- adding tripyridyltriazine to the first solvent, followed by stirring and then standing still to obtain a phthalocyanine complex having a chemical structure of Formula (11);
- dissolving the phthalocyanine complex in a second solvent, and adding a catalyst to the second solvent for reaction;
- performing quenching, extraction, and separation and purification by column chromatography, to obtain a phthalocyanine trimer of chemical structure (12);
- and
- eluting the phthalocyanine trimer to obtain the color resist material having a chemical structure represented by Formula (1):
- wherein each of chemical structures U1, U2 and U3 is represented by Formula (1-2):
- wherein Z has an end connected to oxygen and another end connected to a double bond in Formula (1), Z is selected from alkylene and —YOX—, where X is selected from alkylene, and Y is selected from arylene,
- wherein in Formula (1), a benzene ring is also connected with other functional groups, each of the other functional groups is independently selected from one of hydrogen, halogen, alkyl, alkoxy, aryl, aryloxy, and a heterocyclic group, and M represents a metal or a metal halide;
- wherein one of Q1 to Q4, one of Q5 to Q8, one of Q9 to Q12, one of Q13 to Q16, one of Q17 to Q20, one of Q21 to Q24, one of Q25 to Q28, one of Q29 to Q32, one of Q33 to Q36, one of Q37 to Q40, one of Q41 to Q44, and one of Q45 to Q48 are selected from —O—Z—CH═CH2, where Z is selected from one of alkylene and —YOX—, in which X is selected from alkylene, and Y is selected from arylene;
- each functional group Q1 to Q48 is independently selected from one of hydrogen, halogen, alkyl, alkoxy, aryl, aryloxy, and a heterocyclic group;
- and
- wherein M is selected from a metal or a metal halide.
Dependencies are inferred from the claim text.