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US 11,728,116 B2Granted
MEMS relay architecture with frequency isolation
AssigneeQorvo US, Inc.
InventorsRoberto Gaddi, Robertus Petrus Van Kampen
Life of this patent
Estimating the term…
Abstract
An electrical arrangement for performing radio frequency isolation for microelectromechanical relay switches. A microelectromechanical relay switch comprises a beam configured to switch from a first position connected to an upper voltage source to a second position connected to a lower voltage source. The microelectromechanical relay switch further comprises at least one frequency isolation circuit or resistor disposed adjacent to the beam. The at least one frequency isolation circuit or resistor biases a direct current potential to allow for electrostatic actuation and further provides a path for transient electrical currents during switching.
Claims22
An electrical arrangement, comprising:
- a first microelectromechanical relay, the first microelectromechanical relay comprising a beam element configured to switch from a first position adjacent to a first electrode to a second position adjacent a second electrode;
- a first RF electrode and second RF electrode configured to be either electrically isolated or electrically coupled to the beam element in the following manner depending on the beam element position:
- when the beam element is in the first position adjacent to the first electrode, the first RF electrode and the second RF electrode are electrically coupled to the beam element;
- and
- when the beam element is in the second position adjacent to the second electrode, the first RF electrode and the second RF electrode are electrically isolated;
- a first isolation circuit electrically coupled to the first electrode and configured to isolate a lower voltage source from the first electrode, wherein the first isolation circuit comprises a first bias resistor;
- a second isolation circuit electrically coupled to the second electrode and configured to isolate an upper voltage source from the second electrode, wherein the second isolation circuit comprises a second bias resistor;
- and
- a ground bias resistor electrically coupled between the beam element and an electrical ground connection.
6 more elements
A circuit, comprising:
- at least two electrical arrangements;
- at least two first RF electrodes of the at least two electrical arrangements electrically coupled together;
- and
- at least two second RF electrodes of the at least two electrical arrangements electrically coupled together, wherein:
- each electrical arrangement of the at least two electrical arrangements comprises:
- a microelectromechanical relay, the microelectromechanical relay comprising a beam element configured to switch from a first position adjacent to a first electrode to a second position adjacent a second electrode;
- the first RF electrode and the second RF electrode configured to be either electrically isolated or electrically coupled to the beam element in the following manner depending on the beam element position:
- when the beam element is in the first position adjacent to the first electrode, the first RF electrode and the second RF electrode are electrically coupled to the beam element;
- and
- when the beam element is in the second position adjacent to the second electrode, the first RF electrode and the second RF electrode are electrically isolated;
- and
- at least one of the at least two beam elements of the at least two electrical arrangements is electrically coupled to an electrical ground connection through at least one ground bias resistor.
9 more elements
A circuit, comprising:
- at least two electrical arrangements;
- a first RF electrode of each of the at least two electrical arrangements electrically coupled together to form one electrical common node;
- and
- at least one shared ground bias resistor electrically coupled to a common ground node, wherein each electrical arrangement of the at least two electrical arrangements comprises:
- a microelectromechanical relay, the microelectromechanical relay comprising a beam element configured to switch from a first position adjacent to a first electrode to a second position adjacent a second electrode;
- the first RF electrode and a second RF electrode configured to be either electrically isolated or electrically coupled to the beam element in the following manner depending on the beam element position:
- when the beam element is in the first position adjacent to the first electrode, the first RF electrode and the second RF electrode are electrically coupled to the beam element;
- and
- when the beam element is in the second position adjacent to the second electrode, the first RF electrode and the second RF electrode are electrically isolated.
6 more elements
Dependencies are inferred from the claim text.