Treatment condition setting method, storage medium, and substrate treatment system

A treatment condition setting method of setting a treatment condition of a predetermined treatment in a substrate treatment system, the substrate treatment system comprising a treatment apparatus configured to perform the predetermined treatment on a substrate,

• the substrate treatment system comprising an imaging apparatus configured to image a surface side of the substrate,
• the treatment condition setting method comprising:
• imaging, by the imaging apparatus, a reference substrate being a substrate which is a reference for setting the treatment condition and acquiring a captured image of the reference substrate based on an imaging result observed from the reference substrate, wherein the reference substrate is formed with a film having a line width or thickness;
• imaging, by the imaging apparatus, a treated substrate being a substrate on which the predetermined treatment has been performed on a predetermined film on the treated substrate, under a current treatment condition and acquiring a captured image of the treated substrate based on an imaging result observed from the treated substrate,
• wherein the predetermined treatment is:
• a treatment of heating the substrate after exposure of a pattern is performed on a resist film as the predetermined film on the substrate, a treatment of supplying a coating solution to the substrate while rotating the substrate to form a coating film as the predetermined film, a treatment of heating the substrate after the coating film as the predetermined film is formed on the substrate, a treatment of forming the predetermined film on the substrate, or a treatment of etching the substrate formed with the predetermined film or etching the predetermined film on the substrate;
• calculating a deviation amount in color information between the captured image of the treated substrate and the captured image of the reference substrate, wherein the color information is correlated with a predetermined line width or predetermined thickness of the predetermined film;
• calculating a correction amount of the treatment condition of the predetermined treatment based on a correlation model indicating a correlation between a change amount in the color information in the captured image of the treated substrate based on the imaging result observed from the treated substrate by the imaging apparatus and a change amount in the treatment condition and on the deviation amount in the color information;
• setting the treatment condition of the predetermined treatment based on the calculated correction amount and on the current treatment condition;
• and
• performing, by the treatment apparatus, the predetermined treatment on a target substrate based on the treatment condition set by the setting.