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US 11,724,353 B2Granted
Chamber components with polished internal apertures
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Vahid Firouzdor, David Koonce, Biraja Prasad Kanungo
Life of this patent
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Abstract
Disclosed herein is a plasma-resistant chamber component and a method for manufacturing the same. A plasma-resistant chamber component of a semiconductor processing chamber that generates a plasma environment includes a ceramic article having multiple polished apertures. A roughness of the multiple polished apertures is less than 32 μin.
Claims11
A method of manufacturing a plasma-resistant chamber component of a processing chamber, the method comprising:
- polishing at least one aperture of the plasma-resistant chamber component, the component disposed inside a ring between a mounting stage and a clamp, wherein a pump configured to flow an abrasive media is fluidly coupled to the plasma-resistant chamber component by the mounting stage, polishing the at least one aperture of the plasma-resistant chamber component by flowing the abrasive media along a first abrasive media flow path from the mounting stage to the clamp through the at least one aperture of the plasma-resistant chamber component and along a second abrasive media flow path between an outer surface of the plasma-resistant chamber component and an inner surface of the ring, and wherein the abrasive media comprises a polymer base and a plurality of abrasive particles.
Dependencies are inferred from the claim text.