Sensor assembly and methods of vapor monitoring in process chambers
AssigneeApplied Materials, Inc.
InventorsXiaozhou Che, Graeme Jamieson Scott, Richard Gustav Hagborg, Alan H. Ouye, Nelson A. Yee
Life of this patent
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Abstract
Methods and systems for monitoring film thickness using a sensor assembly include a process chamber having a chamber body, a substrate support disposed in the chamber body, a lid disposed over the chamber body, and a sensor assembly coupled to the chamber body at a lower portion of the sensor assembly. The sensor assembly is coupled to the lid at an upper portion of the sensor assembly. The sensor assembly includes one or more apertures disposed through one or more sides of the sensor assembly, and the one or more sensors are disposed in the sensor assembly through the one or more of the apertures.
Claims18
A process chamber comprising:
- a chamber body;
- a substrate support disposed in the chamber body;
- a lid disposed over the chamber body;
- and
- a sensor assembly coupled to the chamber body at a lower portion of the sensor assembly, the sensor assembly coupled to the lid at an upper portion of the sensor assembly, the sensor assembly further comprising:
- one or more apertures disposed through one or more sides of the sensor assembly;
- one or more sensors disposed in the sensor assembly through the one or more of the apertures;
- and
- a shelf, the shelf comprising grooves substantially aligned with the one or more apertures and configured to receive each of the one or more sensors.
A method for processing a substrate comprising:
- exposing a first substrate to a first set of vapors within a process chamber while monitoring at least one attribute of the first set of vapors with a first sensor disposed in a sensor assembly, the sensor assembly disposed between a lid and chamber body and circumscribing a showerhead;
- removing the first substrate from the process chamber;
- replacing the first sensor with a second sensor without opening the lid of the process chamber;
- and
- exposing a second substrate to a second set of vapors within the process chamber while monitoring at least one attribute of the second set of vapors with the second sensor disposed in the sensor assembly, wherein the sensor assembly is coupled to the chamber body at a lower portion of the sensor assembly, the sensor assembly coupled to the lid at an upper portion of the sensor assembly, the sensor assembly further comprising:
- one or more apertures disposed through one or more sides of the sensor assembly, wherein the first sensor is disposed in the sensor assembly through the one or more of the apertures;
- and
- a shelf, the shelf comprising grooves substantially aligned with the one or more apertures and configured to receive the first sensor and second sensor.
Dependencies are inferred from the claim text.