Back to results
US 11,718,802 B2Granted
Temperature profile in an advanced thermal treatment apparatus and method
AssigneeStandard Gas Limited
InventorDaniel Michael Donegan
Life of this patent
Estimating the term…
Abstract
Applying heat from a heat source to a first region to cause a first pyrolysis process, the first pyrolysis process resulting in a gaseous mixture, and applying heat from the heat source to a second region to cause a second pyrolysis process, the second pyrolysis process being applied to the gaseous mixture, wherein the second region is located closer to the heat source than the first region. Pyrolysis is used to destroy oils, tars and/or PAHs in carbonaceous material.
Claims19
An advanced thermal treatment (ATT) method comprising:
- applying heat from a heat source to a first region to cause a first advanced thermal treatment (ATT) process, the first ATT process resulting in a gaseous mixture;
- applying heat from the heat source to a second region in the form of a gas enclosure to cause a second ATT process, the second ATT process being applied to a gaseous mixture received from a third region, the gas enclosure having a diameter less than the first region;
- and
- applying heat from the heat source to the third region, coupled in between the first region and the second region, to cause a third ATT process, the third ATT process being applied to the gaseous mixture received from the first region, wherein the third region has a diameter smaller than the first region.
1 more element
An advanced thermal treatment (ATT) method comprising:
- receiving feedstock in a first region in the form of at least a first retort;
- applying heat from at least one heat source to the first region to cause a first advanced thermal treatment (ATT) process, the first ATT process resulting in a gaseous mixture;
- receiving the gaseous mixture, from the first region, in a second region that has a diameter smaller than the first retort;
- applying heat from the at least one heat source to the gaseous mixture to cause a second ATT process in the second region;
- receiving the gaseous mixture, from the second region, in a third region in the form of a gas enclosure that has a diameter less than the first retort;
- applying heat from the at least one heat source to the gaseous mixture in the third region to cause a third ATT process.
3 more elements
Dependencies are inferred from the claim text.