Composition for forming organic film, patterning process, and polymer

A composition for forming an organic film, comprising:

• an organic solvent;
• and
• a polymer containing a repeating unit shown by the following general formula (1A) as a partial structure:
• wherein:
• AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent;
• W1 represents any in the following general formula (1B), and the polymer optionally contains two or more kinds of W1 in combination,
• wherein:
• each R1 represents a monovalent organic group having 1 to 10 carbon atoms and an unsaturated bond;
• and
• R2 represents a monovalent organic group having 6 to 20 carbon atoms and one or more aromatic rings;
• and
• W2 is any in the following general formula (1E),
• wherein:
• AR3 and AR4 each represent a benzene ring or a naphthalene ring which optionally have a substituent;
• and
• W3 represents a divalent organic group having 6 to 50 carbon atoms and one or more aromatic rings.

A composition for forming an organic film, comprising:

• a mixture of one or more organic solvents each having a boiling point of lower than 180° C. and one or more organic solvents each having a boiling point of 180° C. or higher;
• and
• a polymer containing a repeating unit shown by the following general formula (1A) as a partial structure,
• wherein:
• AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent;
• W1 represents any in the following general formula (1B), and the polymer optionally contains two or more kinds of W1 in combination,
• wherein:
• each R1 represents a monovalent organic group having 1 to 10 carbon atoms and an unsaturated bond;
• and
• R2 represents a monovalent organic group having 6 to 20 carbon atoms and one or more aromatic rings;
• and
• W2 represents a divalent organic group having 1 to 80 carbon atoms.

A polymer comprising a repeating unit shown by the following general formula (1A) as a partial structure,

• wherein:
• AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent;
• W1 represents any in the following general formula (1B), and the polymer optionally contains two kinds of W1 in combination:
• wherein:
• each R1 is any in the following general formula (1C),
• and
• R2 is any in the following general formula (1D),
• and
• W2 represents a divalent organic group having 1 to 80 carbon atoms.

A polymer comprising a repeating unit shown by the following general formula (1A) as a partial structure,

• wherein:
• AR1 and AR2 each represent a benzene ring or a naphthalene ring which optionally have a substituent;
• W1 represents any in the following general formula (1B), and the polymer optionally comprises two or more kinds of W1 in combination,
• wherein:
• each R1 represents a monovalent organic group having 1 to 10 carbon atoms and an unsaturated bond;
• and
• R2 represents a monovalent organic group having 6 to 20 carbon atoms and one or more aromatic rings;
• and
• W2 is any in the following general formula (1E),
• wherein:
• AR3 and AR4 each represent a benzene ring or a naphthalene ring which optionally have a substituent;
• and
• W3 represents a divalent organic group having 6 to 50 carbon atoms and one or more aromatic rings.