Fabrication of high-aspect ratio nanostructures by localized nanospalling effect
AssigneeKhalifa University of Science and Technology
InventorsRaquel Flores, Ricardo Janeiro, Jaime Viegas
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Abstract
In this work is presented a method for fabrication of high-aspect ratio structures through spalling effect. The spalling is achieved through lithography, etching and sputtering processes, thus providing the flexibility to position the spalled structures according to the application requirements. This method has been successfully demonstrated for metal-oxides and metals. The width of the fabricated structures is dependent on the thickness of the film deposited by sputtering, where structures as small as 20 nm in width have been obtained.
Claims17
A method for fabrication of high-aspect ratio structures, the method comprising:
- exposing, using ultraviolet light, a portion of a sample including photoresist, the sample positioned on a substrate and the photoresist comprising a photoactive compound;
- etching, using reactive ion etching, the portion of the sample without photoresist;
- ashing, using plasma cleaning, the exposed portion of the photoresist, the ashing replacing exposed portion of the photoresist with carbon residue;
- and
- depositing, using RF sputter deposition, a thin film on the carbon residue.
A method comprising:
- defining, with a first lithography, a pattern shape in a photoresist positioned on a substrate;
- removing the pattern of the photoresist, the removing leaving a layer of carbon residue in the pattern shape;
- depositing a thin film on the layer of carbon residue;
- spalling of the thin film around a periphery of the pattern, the spalling generating 3D nanowalls along the periphery of the pattern.
Dependencies are inferred from the claim text.